ECE Special Seminar: Spectroscopic Ellipsometry

Spectroscopic ellipsometry is a non-destructive optical technique, precisely characterizing thin films from sub-nanometer to tens of microns thick. The technique has grown rapidly in recent years, covering a wide range of the electromagnetic spectrum, from deep ultra-violet to terahertz frequencies. Ellipsometry is sensitive to film thickness, refractive index, uniformity, bandgap energy, alloy composition, anisotropy or surface roughness. In-situ and dynamic ellipsometry has been attracting more and more attention, providing real-time process control and property monitoring. In this presentation, we will review the principles of spectroscopic ellipsometry. Common and advanced applications using ellipsometer in the fields of semiconductor, lithography, display, optical coatings, photovoltaic, bio- and chemical materials, and in-situ processes will be demonstrated. The J.A. Woollam company has been specializing in spectroscopic ellipsometry and thin film solutions for over 35 years. The company offers the most advanced, versatile, and reliable ellipsometers for cutting-edge material research and manufacturing metrology. Dr. Jianing Sun joined the J. A. Woollam Company in 2008 and has been an Applications Engineer since. Dr. Sun got her Bachelor and Master degrees in Chemical Engineering at Tsinghua University and her Ph.D. in Materials Science and Engineering at the University of Michigan.